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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - New fast-etching bottom antireflective coatings for 248-nm lithography
Puligadda, Rama, Huang, Runhui, Cox, Chris, Lamb III, James E., Arjona, Manuel, Claypool, James B., Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436916
File:
PDF, 671 KB
english, 2001