SPIE Proceedings [SPIE Optical/Laser Microlithography IV - San Jose, United States (Wednesday 6 March 1991)] Optical/Laser Microlithography IV - Improvement of focus and exposure latitude by the use of phase-shifting masks for DUV applications
Op de Beeck, Maaike, Tokui, Akira, Fujinaga, Masato, Yoshioka, Nobuyuki, Kamon, Kazuya, Hanawa, Tetsuro, Tsukamoto, Katsuhiro, Pol, VictorVolume:
1463
Year:
1991
Language:
english
DOI:
10.1117/12.44781
File:
PDF, 1.47 MB
english, 1991