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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Characterizing and understanding stray tilt: the next major contributor to CD SEM tool matching
Solecky, Eric P., Herr, Daniel J., Archie, Charles N., Mayer, Jason, Cornell, Roger S., Adan, OferVolume:
5038
Year:
2003
Language:
english
DOI:
10.1117/12.485033
File:
PDF, 171 KB
english, 2003