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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - Updated NIST photomask linewidth standard
Potzick, James E., Herr, Daniel J., Pedulla, J. M., Stocker, Michael T.Volume:
5038
Year:
2003
Language:
english
DOI:
10.1117/12.487735
File:
PDF, 196 KB
english, 2003