SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Influence of line-edge roughness on MOSFET devices with sub-50-nm gates
Shibata, Kiyoshi, Silver, Richard M., Izumi, Naoki, Tsujita, KouichirouVolume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.534508
File:
PDF, 356 KB
english, 2004