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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Advances in Resist Technology and Processing XXI - Effects of airborne molecular contamination on 157-nm resists: AMC friend or foe?
Meute, Jeff J., Sturtevant, John L., Rich, Georgia, Turnquest, Karen, Dean, Kim, Patel, Shashikant, Graffenberg, Victoria L., Rodriguez, Michael P.Volume:
5376
Year:
2004
Language:
english
DOI:
10.1117/12.537652
File:
PDF, 347 KB
english, 2004