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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Aerial image measurement technique for automated reticle defect disposition (ARDD) in wafer fabs
Zibold, Axel M., Tanabe, Hiroyoshi, Schmid, Rainer M., Stegemann, B., Scheruebl, Thomas, Harnisch, Wolfgang, Kobiyama, YujiVolume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557811
File:
PDF, 305 KB
english, 2004