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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Evaluation of printability of crystal growth defects in a 193nm lithography environment using AIMS
Schmid, Rainer, Staud, Wolfgang, Weed, J. Tracy, Zibold, Axel M., Bhattacharyya, Kaustuve, Chen, Xuemei, Grenon, Brian J.Volume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.569375
File:
PDF, 477 KB
english, 2004