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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Double exposure for the contact layer of the 65-nm node
Owe-Yang, Dah-Chung, Sturtevant, John L., Yu, S. S., Chen, Harrison, Chang, C. Y., Ho, Bang-Chein, Lin, John C., Lin, Burn J.Volume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.599651
File:
PDF, 643 KB
english, 2005