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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications
Philipsen, Vicky, Komuro, Masanori, Leunissen, Leonardus, De Ruyter, Rudi, Jonckheere, Rik, Martin, Patrick, Wakefield, Clare, Johnson, Stephen, Cangemi, Michael, Buxbaum, Alex, Morrison, TroyVolume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617438
File:
PDF, 508 KB
english, 2005