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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Optimization of contact hole lithography for 65nm node logic LSI
Setta, Yuji, Flagello, Donis G., Futatsuya, Hiroki, Sagisaka, Atsushi, Chijimatsu, Tatsuo, Minami, Takayoshi, Sugimoto, Fumitoshi, Ishikawa, Seiichi, Asai, SatoruVolume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656224
File:
PDF, 354 KB
english, 2006