SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Critical dimension AFM tip characterization and image reconstruction applied to the 45-nm node
Dahlen, Gregory, Archie, Chas N., Osborn, Marc, Liu, Hao-Chih, Jain, Rohit, Foreman, William, Osborne, Jason R.Volume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.656848
File:
PDF, 1.64 MB
english, 2006