SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Design and Process Integration for Microelectronic Manufacturing IV - Simple method to verify OPC data based on exposure condition
Moon, James, Wong, Alfred K. K., Singh, Vivek K., Ahn, Young-Bae, Oh, Sey-Young, Nam, Byung-Ho, Yim, Dong GyuVolume:
6156
Year:
2006
Language:
english
DOI:
10.1117/12.656888
File:
PDF, 295 KB
english, 2006