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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Ultra-low k 1 oxide contact hole formation and metal filling using resist contact hole pattern by double L&S formation method
Nakamura, Hiroko, Flagello, Donis G., Omura, Mitsuhiro, Yamashita, Souichi, Taniguchi, Yasuyuki, Abe, Junko, Tanaka, Satoshi, Inoue, SoichiVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.709133
File:
PDF, 1.02 MB
english, 2007