SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Assessment of trade-off between resist resolution and sensitivity for optimization of hyper-NA immersion lithography
Kishikawa, Yasuhiro, Flagello, Donis G., Kawashima, Miyoko, Ohkubo, Akinori, Iwasaki, Yuichi, Takeuchi, Seiji, Yoshii, Minoru, Honda, TokuyukiVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.711420
File:
PDF, 409 KB
english, 2007