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SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Verification of the modified model of drying process of a polymer liquid film on a flat substrate by experiment (3) - using organic solvent
Kagami, Hiroyuki, Watanabe, HidehiroVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.728980
File:
PDF, 474 KB
english, 2007