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SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Reduction of resist heating effect by writing order optimization: part II
Goto, Kazuya, Watanabe, Hidehiro, Watakabe, Kazutaka, Komagata, Tadashi, Nakagawa, YasutoshiVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.728984
File:
PDF, 295 KB
english, 2007