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SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - PMJ 2007 panel discussion overview: double exposure and double patterning for 32-nm half-pitch design node
Nagaoka, Yoshinori, Naber, Robert J., Kawahira, Hiroichi, Watanabe, HidehiroVolume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.752596
File:
PDF, 385 KB
english, 2007