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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Evaluation of EUV scatterometry for CD characterization of EUV masks using rigorous FEM-simulation
Scholze, Frank, Schellenberg, Frank M., Laubis, Christian, Ulm, Gerhard, Dersch, Uwe, Pomplun, Jan, Burger, Sven, Schmidt, FrankVolume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.771923
File:
PDF, 913 KB
english, 2008