SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Comparison of spectroscopic Mueller polarimetry, standard scatterometry, and real space imaging techniques (SEM and 3D-AFM) for dimensional characterization of periodic structures
De Martino, A., Allgair, John A., Raymond, Christopher J., Foldyna, M., Novikova, T., Cattelan, D., Barritault, P., Licitra, C., Hazart, J., Foucher, J., Bogeat, F.Volume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.772721
File:
PDF, 534 KB
english, 2008