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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - Reliability report of high power injection lock laser light source for double exposure and double patterning ArF immersion lithography
Tsushima, Hiroaki, Levinson, Harry J., Dusa, Mircea V., Yoshino, Masaya, Ohta, Takeshi, Kumazaki, Takahito, Watanabe, Hidenori, Matsumoto, Shinichi, Nakarai, Hiroaki, Umeda, Hiroshi, Kawasuji, YasufumVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.813642
File:
PDF, 299 KB
english, 2009