SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Sensitivity of EUV resists to out-of-band radiation
Roberts, Jeanette M., Henderson, Clifford L., Bristol, Robert L., Younkin, Todd R., Fedynyshyn, Theodore H., Astolfi, David K., Cabral, AlbertoVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814342
File:
PDF, 406 KB
english, 2009