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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Study on surface integrity in photomask resist strip and final cleaning processes
Singh, Sherjang, Hosono, Kunihiro, Helbig, Stefan, Dress, Peter, Dietze, UweVolume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824254
File:
PDF, 522 KB
english, 2009