![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Model-based assist feature insertion for sub-40nm memory device
Suh, Sungsoo, Hosono, Kunihiro, Lee, Suk-joo, Choi, Seong-woon, Lee, Sung-Woo, Park, Chan-hoonVolume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824343
File:
PDF, 446 KB
english, 2009