SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Flexible 60-90W ArF light source for double patterning immersion lithography in high volume manufacturing
Rokitski, Slava, Chen, Alek C., Han, Woo-Sung, Ishihara, Toshi, Rao, Rajeskar, Lin, Burn J., Yen, Anthony, Jiang, Rui, Riggs, Daniel, Haviland, Mary, Cacouris, Theodore, Brown, DanielVolume:
7520
Year:
2009
Language:
english
DOI:
10.1117/12.839803
File:
PDF, 303 KB
english, 2009