SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - A study of defects on EUV masks using blank inspection, patterned mask inspection, and wafer inspection
La Fontaine, Bruno M., Huh, Sungmin, Ren, Liping, Chan, David, Wurm, Stefan, Goldberg, Kenneth, Mochi, Iacopo, Nakajima, Toshio, Kishimoto, Masahiro, Ahn, Byungsup, Kang, Inyong, Park, Joo-on, Cho, KyVolume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.846922
File:
PDF, 977 KB
english, 2010