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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Reaction kinetics of non-reciprocal photo-base generator (NRPBG) patterning
Shykind, D., Allen, Robert D., Bristol, R., Roberts, J., Blackwell, J., Borodovsky, Y.Volume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846990
File:
PDF, 299 KB
english, 2010