SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Three-dimensional mesoscale model for the simulation of LER in photoresists
Lawson, Richard A., Allen, Robert D., Henderson, Clifford L.Volume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.848415
File:
PDF, 386 KB
english, 2010