SPIE Proceedings [SPIE 26th European Mask and Lithography Conference - Grenoble, France (Monday 18 January 2010)] 26th European Mask and Lithography Conference - Impact of mask absorber on EUV imaging performance
van Setten, Eelco, Behringer, Uwe F.W., Maurer, Wilhelm, Man, Cheuk Wah, Murillo, Rogelio, Lok, Sjoerd, van Ingen Schenau, Koen, Feenstra, Kees, Wagner, ChristianVolume:
7545
Year:
2010
Language:
english
DOI:
10.1117/12.864251
File:
PDF, 307 KB
english, 2010