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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - EUVL compatible LER solutions using functional block copolymers
Cheng, Han-Hao, Keen, Imelda, Yu, Anguang, Chuang, Ya-Mi, Blakey, Idriss, Jack, Kevin S., Leeson, Michael J., Younkin, Todd R., Whittaker, Andrew K., Tong, William M.Volume:
8323
Year:
2012
Language:
english
DOI:
10.1117/12.916744
File:
PDF, 3.23 MB
english, 2012