SPIE Proceedings [SPIE 1989 Microelectronic Intergrated Processing Conferences - Santa Clara (Tuesday 10 October 1989)] Dry Processing for Submicrometer Lithography - In-situ Particulate Contamination Studies In Process Plasmas
Selwyn, Gary S., McKillop, John S., Haller, Kurt L., Bondur, James A., Reinberg, Alan R.Volume:
1185
Year:
1990
Language:
english
DOI:
10.1117/12.978049
File:
PDF, 1.22 MB
english, 1990