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SPIE Proceedings [SPIE SPIE Optical Systems Design - Barcelona, Spain (Monday 26 November 2012)] Optical Systems Design 2012 - Imaging characteristics of binary and phase shift masks for EUV projection lithography
Erdmann, Andreas, Evanschitzky, Peter, Mazuray, Laurent, Wartmann, Rolf, Wood, Andrew P., de la Fuente, Marta C., Tissot, Jean-Luc M., Raynor, Jeffrey M., Kidger, Tina E., David, Stuart, Benítez, PablVolume:
8550
Year:
2012
Language:
english
DOI:
10.1117/12.981444
File:
PDF, 1.31 MB
english, 2012