SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Sampling strategy: optimization and correction for high-order overlay control for 45nm process node
Hsueh, Bo Yun, Allgair, John A., Raymond, Christopher J., Huang, George K. C., Yu, Chun-Chi, Huang, Chin-Chou Kevin, Huang, Chien-Jen, Manka, James R., Tien, DavidVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.812929
File:
PDF, 344 KB
english, 2009