Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride...

ACS Applied Materials & Interfaces 2016 / 08 Vol. 8; Iss. 32

Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using a Novel Silylamine Precursor

Park, Jae-Min, Jang, Se Jin, Yusup, Luchana L., Lee, Won-Jun, Lee, Sang-Ick
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Volume:
8
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/acsami.6b06175
Date:
August, 2016
File:
PDF, 4.17 MB
english, 2016
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