SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Introduction of a die-to-database verification tool for the entire printed geometry of a die: geometry verification system NGR2100 for DFM
Kitamura, Tadashi, Komuro, Masanori, Kubota, Kazufumi, Hasebe, Toshiaki, Sakai, Futoshi, Nakazawa, Shinichi, Vohra, Neeti, Yamamoto, Masahiro, Inoue, MasahiroVolume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.620389
File:
PDF, 321 KB
english, 2005