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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Imprint technology: A potential low-cost solution for sub-45nm device applications
Le, Ngoc V., Lercel, Michael J., Dauksher, William J., Gehoski, Kathy A., Nordquist, Kevin J., Ainley, Eric, Mangat, PawitterVolume:
6151
Year:
2006
Language:
english
DOI:
10.1117/12.657488
File:
PDF, 792 KB
english, 2006