Comparison of wet chemical treatment and Ar-ion sputtering...

Materials Science in Semiconductor Processing 2016 / 08 Vol. 51

Comparison of wet chemical treatment and Ar-ion sputtering for GaInP2(100) surface preparation

Lebedev, Mikhail V., Kalyuzhnyy, Nikolay A., Mintairov, Sergey A., Calvet, Wolfram, Kaiser, Bernhard, Jaegermann, Wolfram
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Volume:
51
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2016.05.005
Date:
August, 2016
File:
PDF, 4.21 MB
english, 2016
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