Study of Plasma Properties for the Low-Temperature...

Study of Plasma Properties for the Low-Temperature Deposition of Highly Conductive Aluminum Doped ZnO Film Using ICP Assisted DC Magnetron Sputtering

Sahu, Bibhuti Bhusan, Han, Jeon Geon, Kim, Jay Bum, Kumar, Manish, Jin, Subong, Hori, Masaru
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
13
Language:
english
Journal:
Plasma Processes and Polymers
DOI:
10.1002/ppap.201500094
Date:
January, 2016
File:
PDF, 1.68 MB
english, 2016
Conversion to is in progress
Conversion to is failed