Study of Plasma Properties for the Low-Temperature Deposition of Highly Conductive Aluminum Doped ZnO Film Using ICP Assisted DC Magnetron Sputtering
Sahu, Bibhuti Bhusan, Han, Jeon Geon, Kim, Jay Bum, Kumar, Manish, Jin, Subong, Hori, MasaruVolume:
13
Language:
english
Journal:
Plasma Processes and Polymers
DOI:
10.1002/ppap.201500094
Date:
January, 2016
File:
PDF, 1.68 MB
english, 2016