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Expanding Thermal Plasma Deposition of Al-Doped ZnO: On the Effect of the Plasma Chemistry on Film Growth Mechanisms
Williams, Benjamin L., Ponomarev, Mikhail V., Verheijen, Marcel A., Knoops, Harm C. M., Chandramohan, Abhinaya, Duval, Leo, van de Sanden, Mauritius C. M., Creatore, MariadrianaVolume:
13
Language:
english
Journal:
Plasma Processes and Polymers
DOI:
10.1002/ppap.201500179
Date:
January, 2016
File:
PDF, 3.16 MB
english, 2016