Conduction in titanium dioxide films and metal–TiO2–Si structures
Kalygina, V. M., Egorova, I. M., Prudaev, I. A., Tolbanov, O. P.Volume:
50
Language:
english
Journal:
Semiconductors
DOI:
10.1134/S1063782616080133
Date:
August, 2016
File:
PDF, 415 KB
english, 2016