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The atomic structure and chemical composition of HfOx (x < 2) films prepared by ion-beam sputtering deposition
Aliev, V S, Gerasimova, A K, Kruchinin, V N, Gritsenko, V A, Prosvirin, I P, Badmaeva, I AVolume:
3
Language:
english
Journal:
Materials Research Express
DOI:
10.1088/2053-1591/3/8/085008
Date:
August, 2016
File:
PDF, 4.81 MB
english, 2016