Chemical Vapor Deposition of Copper Thin Films with (hexafluoroacetylacetonate)Cu(allyltrimethylsilane)
Park, Man-YoungVolume:
1
Year:
1999
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.1390625
File:
PDF, 32 KB
english, 1999