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Etching Characteristics and Mechanisms of Ti-Sb-Te Phase Change Material in CHF 3 /O 2 /Ar Plasma for Nano-Devices
Wang, Weiwei, Liu, Bo, Jin, Qiuxue, Xia, Yangyang, Wang, Qing, Yao, Dongning, Song, Sannian, Song, Zhitang, Guo, Xiaohui, Zheng, Hao, Feng, SonglinVolume:
5
Year:
2016
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.0191609jss
File:
PDF, 670 KB
english, 2016