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Plasma Chemistry and Plasma Processing 2016 / 8

Comparison of the Active Species in the RF and Microwave Flowing Discharges of N2 and Ar–20 %N2

Ricard, André, Sarrette, Jean-Philippe, Oh, Soo-Ghee, Kim, Yu Kwon
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Language:
english
Journal:
Plasma Chemistry and Plasma Processing
DOI:
10.1007/s11090-016-9739-9
Date:
August, 2016
File:
PDF, 572 KB
english, 2016
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