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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Source mask optimization study based on latest Nikon immersion scanner
Erdmann, Andreas, Kye, Jongwook, Zhu, Jun, Wei, Fang, Chen, Lijun, Zhang, Chenming, Zhang, Wei, Nishinaga, Hisashi, El-Sewefy, Omar, Gao, Gen-Sheng, Lafferty, Neal, Meiring, Jason, Zhang, Recoo, Zhu,Volume:
9780
Year:
2016
Language:
english
DOI:
10.1117/12.2223576
File:
PDF, 2.22 MB
english, 2016