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(Invited) Low-Temperature Microwave-Based Plasma Oxidation of Ge and Oxidation of Silicon Followed by Plasma Nitridation
Lerch, W., Schick, T., Sacher, N., Kegel, W., Niess, J., Czernohorsky, M., Riedel, S.Volume:
72
Language:
english
Journal:
ECS Transactions
DOI:
10.1149/07204.0101ecst
Date:
May, 2016
File:
PDF, 566 KB
english, 2016