Fabrication of TaOxNy thin films by reactive ion...

Thin Solid Films 2016 / 09 Vol. 615

Fabrication of TaOxNy thin films by reactive ion beam-assisted ac double magnetron sputtering for optical applications

Bah, Souleymane T., Ba, Cheikhou O.F., D'Auteuil, Marc, Ashrit, P.V., Soreli, Luca, Vallée, Réal
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Volume:
615
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2016.07.055
Date:
September, 2016
File:
PDF, 1.27 MB
english, 2016
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