HfO 2 /Al 2...

Nanotechnology 2016 / 09 Vol. 27; Iss. 39

HfO 2 /Al 2 O 3 multilayer for RRAM arrays: a technique to improve tail-bit retention

Huang, Xueyao, Wu, Huaqiang, Bin Gao,, Sekar, Deepak C, Dai, Lingjun, Kellam, Mark, Bronner, Gary, Deng, Ning, Qian, He
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Volume:
27
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/27/39/395201
Date:
September, 2016
File:
PDF, 2.07 MB
english, 2016
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