Properties of atmospheric pressure plasma oxidized layers...

Open Chemistry 2014 / 01 Vol. 13; Iss. 1

Properties of atmospheric pressure plasma oxidized layers on silicon wafers

Skácelová, Dana, Sládek, Petr, Sťahel, Pavel, Pawera, Lukáš, Haničinec, Martin, Meichsner, Jürgen, Černák, Mirko
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Volume:
13
Language:
english
Journal:
Open Chemistry
DOI:
10.1515/chem-2015-0047
Date:
January, 2014
File:
PDF, 1.71 MB
english, 2014
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