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SPIE Proceedings [SPIE 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies - Dalian, China (Monday 26 April 2010)] 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Design, Manufacturing, and Testing of Micro- and Nano-Optical Devices and Systems - Nanolithography in the evanescent near-field by using gain-assisted meta-materials system
Yang, Yong, Ye, Tianchun, Han, Sen, Yan, Wei, Wang, Jian, Kameyama, Masaomi, Hu, Song, Li, Yanli, Zhao, Lixin, Hu, Song, Li, ZhanVolume:
7657
Year:
2010
Language:
english
DOI:
10.1117/12.866808
File:
PDF, 1.17 MB
english, 2010